Fundamental Research | Innovative Choice in Photosensitive Resin Synthesis —— Cycloaliphatic Epoxy Methacrylate

TTA15 (3,4-Epoxy Cyclohexylmethyl Methacrylate) is a cycloaliphatic epoxy methacrylate compound. Due to its unique structure, it has a wide range of applications and outstanding performance advantages in the field of functional materials.

Application Scenario 1: Photosensitive Resin

TTA15 serves as a raw material for the synthesis of photosensitive resins. It can flexibly adapt to the requirements of reactive functional groups, providing unique properties to photosensitive resins and is widely used in the field of electronic materials.

Typical Reaction 1: Copolymerization

TTA15 can copolymerize with vinyl monomers that have free radical polymerization capabilities, such as (meth)acrylic acid, (meth)acrylates, and styrene. This introduces cycloaliphatic epoxy functional groups as side chains on the polymer. Compared with the commonly used GMA (Glycidyl Methacrylate), TTA15 has higher cationic reaction activity and better polymerization stability.

Typical Reaction 2: Ring-Opening Addition Reaction

TTA15 can react with -COOH or anhydride groups in acrylic copolymer resins, retaining the double bond functional groups and introducing cyclohexane structures. This endows the photosensitive resin with excellent strength, chemical resistance, and resistance to yellowing.

Application Scenario 2: UV Coatings/Inks/Adhesives

TTA15 has both the double bond functional groups for free radical curing and the highly reactive cycloaliphatic epoxy groups for cationic reactions. In formulations, it can be used as a UV-active diluent/monomer. Especially in dual-curing systems that involve both free radical and cationic curing, TTA15 participates in both free radical and cationic polymerization reactions. This balances the fast curing speed of free radical curing with the low shrinkage and excellent chemical and weather resistance of cationic curing. It is widely used in special UV coatings, inks, and adhesives.